A researcher in a cleanroom suit uses a tool in the nanofabrication cleanroom, part of the chemical mechanical polishing process
Zepler Cleanrooms

Chemical mechanical polishing

Chemical Mechanical Polishing (CMP) is used as a planarisation technique in front end of line (FEOL) and back end of line (BEOL) processing

About our chemical mechanical polishing capability

Part of the nanofabrication cleanrooms

CMP is an important capability, with multiple applications during semiconductor device fabrication. It is a part of:

  • planarisation during the complementary metal-oxide-semiconductor (CMOS) process  
  • backend integrated circuit (IC) manufacturing including re-distribution layers (RDL)
  • wafer via and through silicon via (TSV) creation
  • thin film thinning
  • post-trench fill planarisation
  • micro-electromechanical systems (MEMS) and opto-MEMS fabrication 

We have 3 Logitech CM62 tools. These provide dedicated routes for non-metal, metal, and copper processing.  

We use dynamic customised polishing templates. This allows processing of almost any size or shape sample, up to 200 millimetre (mm) wafers.  

These tools are ideal for scale up of research processes to pilot line production level equipment. 

Watch Logitech's ORBIS video 

 

Processes and equipment

Logitech ORBIS CM62

 

  • 200mm, 150mm, and 100mm static templates for SEMI standard wafer processing
  • dynamic template fabrication for diced substrates, irregular shape substrates, and non-SEMI standard wafers
  • dynamic template sample overhang adjustable via backing shims
  • twin peristaltic pumps control slurry capacity through two separate nozzles. Different slurries can be used in each pump if required
  • adjustable slurry dilution via in-situ mixing with water
  • choice of hard or soft polishing pad, with diamond or brush conditioners
  • standard slurries available for silicon and silicon dioxide (SiO2) polishing, other slurries possible on request

 

Contact us

For more information or to book the facilities, get in touch:

zepler.cleanrooms@soton.ac.uk