Research outputs Lloyd's mirror interference lithography with EUV radiation from a high-harmonic source Hyunsu Kim, Peter Baksh, Michal Odstrčil, Magdalena Miszczak, Larissa Juschkin, William Brocklesby & Jeremy Frey, 2016, Applied Physics Express, 9(7), 76701 DOI: 10.7567/APEX.9.076701 Type: article